• Hydrofluoric Acid

   Used for removing SiOx from semiconductor wafers; thinning glass in the panel industry; atomizing solar templates to improve power generation efficiency.

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• Ammonium Fluoride

    Used in the manufacturing of buffered oxide etchant used in the semiconductor and panel industries

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• Buffered Oxide Etchant

    Widely used in the semiconductor and panel industries, it can effectively control the etching rate, the surface roughness of wafers and glass, and achieve wettability by reducing surface tension